A combined top-down/bottom-up approach for the nanoscale patterning of spin-crossover coordination polymers
Micro- and nanometer-sized patterns of the spin-crossover coordination polymer Fe(pyrazine)[Pt(CN)4] were fabricated using a combination of top-down (lift-off) and bottom-up (MSA) methods. Thus, Au-coated Si wafer was coated with PMMA resist in which square-shaped patterns of different sizes and d. were written by a focused electron-beam lithog. After development, the substrates were dipped into a solutionof 4,4'-azopyridine to form an anchoring layer. Multilayer deposition occurred in the opening areas and on the PMMA areas via a successive adsorption of Fe2+, [Pt(CN)4]2+ and pyrazine from diluted solutions (15 cycles). The patterns were transferred by lifting off PMMA areas. These obtained coordination polymer patterns exhibit a bistability of their electronic states and, thus, represent a novel platform for a wide array of potential applications.
Références
- Titre
- A combined top-down/bottom-up approach for the nanoscale patterning of spin-crossover coordination polymers
- Type de publication
- Article de revue
- Année de publication
- 2007
- Auteurs
- Molnar, Gabor, Cobo Saioa, Real Jose Antonio, Carcenac Franck, Daran Emmanuelle, Vieu Christophe, and Bousseksou Azzedine
- Revue
- Adv. Mater. (Weinheim, Ger.
- Volume
- 19
- Pagination
- 2163–2167
- ISSN
- 0935-9648
Soumis le 26 juin 2018