A combined top-down/bottom-up approach for the nanoscale patterning of spin-crossover coordination polymers

Micro- and nanometer-sized patterns of the spin-crossover coordination polymer Fe(pyrazine)[Pt(CN)4] were fabricated using a combination of top-down (lift-off) and bottom-up (MSA) methods. Thus, Au-coated Si wafer was coated with PMMA resist in which square-shaped patterns of different sizes and d. were written by a focused electron-beam lithog. After development, the substrates were dipped into a solutionof 4,4'-azopyridine to form an anchoring layer. Multilayer deposition occurred in the opening areas and on the PMMA areas via a successive adsorption of Fe2+, [Pt(CN)4]2+ and pyrazine from diluted solutions (15 cycles). The patterns were transferred by lifting off PMMA areas. These obtained coordination polymer patterns exhibit a bistability of their electronic states and, thus, represent a novel platform for a wide array of potential applications.

Références

Titre
A combined top-down/bottom-up approach for the nanoscale patterning of spin-crossover coordination polymers
Type de publication
Article de revue
Année de publication
2007
Revue
Adv. Mater. (Weinheim, Ger.
Volume
19
Pagination
2163–2167
ISSN
0935-9648
Soumis le 26 juin 2018